Influence of Different N<sub>2</sub>/H<sub>2</sub> Ratios by Chemical Vapor Deposition on the Performance of TiN Films

Zhang Linrong; Zhang Fulin

doi:10.13374/j.issn1001-053x.1988.03.014

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Zhang Linrong, Zhang Fulin. Influence of Different N2/H2 Ratios by Chemical Vapor Deposition on the Performance of TiN Films[J]. Chinese Journal of Engineering, 1988, 10(3): 360-363. doi: 10.13374/j.issn1001-053x.1988.03.014

Citation:

Zhang Linrong, Zhang Fulin. Influence of Different N₂/H₂ Ratios by Chemical Vapor Deposition on the Performance of TiN Films[J]. Chinese Journal of Engineering, 1988, 10(3): 360-363. doi: 10.13374/j.issn1001-053x.1988.03.014

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Influence of Different N₂/H₂ Ratios by Chemical Vapor Deposition on the Performance of TiN Films

doi: 10.13374/j.issn1001-053x.1988.03.014

Received Date: 1987-10-17
Available Online: 2021-11-15

Abstract

Abstract

Titanium nitride can be coated on the steel-base and cemented-carbides to improve the resistant to wear and corrosion.
The effect of different N₂/H₂ ratios on the lattice parameter, hardness and the rate of the TiN deposition are researched in this paper. The results show that when optimum N₂/H₂ ratio appriximates to 0.5, the stoichiometric TiN will be formed. The hardness and the deposition rate of TiN film reach their maximum, and the lifetime of the treated surface increases by three times as compared with that of untreated ones.
- chemical vapor deposition,
- titanium nitride,
- dies,
- coat