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Volume 27 Issue 2
Aug.  2021
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Article Contents
XIONG Xiaotao, YAN Liangchen, YANG Huisheng, WANG Yanbin. Deposition technology and properties of chromium oxide coatings by RF reactive sputtering[J]. Chinese Journal of Engineering, 2005, 27(2): 205-208,212. doi: 10.13374/j.issn1001-053x.2005.02.050
Citation: XIONG Xiaotao, YAN Liangchen, YANG Huisheng, WANG Yanbin. Deposition technology and properties of chromium oxide coatings by RF reactive sputtering[J]. Chinese Journal of Engineering, 2005, 27(2): 205-208,212. doi: 10.13374/j.issn1001-053x.2005.02.050

Deposition technology and properties of chromium oxide coatings by RF reactive sputtering

doi: 10.13374/j.issn1001-053x.2005.02.050
  • Received Date: 2004-09-06
  • Rev Recd Date: 2004-11-02
  • Available Online: 2021-08-17
  • The RF reactive sputtering method was used to deposit wear resistant chromium oxide coatings and the properties of the coatings were studied. The results showed that there existed two modes of sputtering during RF reactive sputtering, i.e., metal sputtering mode and nonmetal sputtering mode caused by the reaction between the target and reactive gas. The deposition rate was very low in the nonmetal sputtering mode. The hardness of chromium oxide coatings depends mainly on the content of Cr2O3 in the coatings and low hardness CrO will form when oxygen is not enough during sputtering. Feeding oxygen near the substrate is an efficient technology for depositing hard chromium oxide coatings at high deposition rate.

     

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