Microstructure of Diamond Thin Films by Microwave Plasma CVD

Yuan Yi; Yang Baoxiong; Bai Yuanqiang; Wang Jianjun; Lu Fanxiu

doi:10.13374/j.issn1001-053x.1994.03.010

Volume 16 Issue 3

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Article Navigation > Chinese Journal of Engineering > 1994 > 16(3): 245-249

Yuan Yi, Yang Baoxiong, Bai Yuanqiang, Wang Jianjun, Lu Fanxiu. Microstructure of Diamond Thin Films by Microwave Plasma CVD[J]. Chinese Journal of Engineering, 1994, 16(3): 245-249. doi: 10.13374/j.issn1001-053x.1994.03.010

Citation:

Yuan Yi, Yang Baoxiong, Bai Yuanqiang, Wang Jianjun, Lu Fanxiu. Microstructure of Diamond Thin Films by Microwave Plasma CVD[J]. Chinese Journal of Engineering, 1994, 16(3): 245-249. doi: 10.13374/j.issn1001-053x.1994.03.010

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Microstructure of Diamond Thin Films by Microwave Plasma CVD

doi: 10.13374/j.issn1001-053x.1994.03.010

Department of Marterials Science and Engineering, USTB, Beijing 100083, PRC

Received Date: 1993-10-08
Available Online: 2021-11-13

Abstract

Abstract

The morphology and the microstructure of six different dianond films deposited by microwave plasma CVD have been studied by SEM and TEM.The observations of microstructure indicate that high dencity microtwins are formed during the(111)planes growth and a few of crystal defects are formed during the(100) planes growth.
- diamond,
- thin films,
- microstructure/MPCVD