Polishing of CVD Diamond Films by Ion Beam Irradiation

Chen Jun; Yang Baoxiong; Wang Jianjun; Lu Fanxiu

doi:10.13374/j.issn1001-053x.1993.05.031

Volume 15 Issue 5

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Chen Jun, Yang Baoxiong, Wang Jianjun, Lu Fanxiu. Polishing of CVD Diamond Films by Ion Beam Irradiation[J]. Chinese Journal of Engineering, 1993, 15(5): 503-507. doi: 10.13374/j.issn1001-053x.1993.05.031

Citation:

Chen Jun, Yang Baoxiong, Wang Jianjun, Lu Fanxiu. Polishing of CVD Diamond Films by Ion Beam Irradiation[J]. Chinese Journal of Engineering, 1993, 15(5): 503-507. doi: 10.13374/j.issn1001-053x.1993.05.031

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Polishing of CVD Diamond Films by Ion Beam Irradiation

doi: 10.13374/j.issn1001-053x.1993.05.031

Department of Materials Science and Engineering

Received Date: 1992-10-15
Available Online: 2021-10-18

Abstract

Abstract

To improve the surface roughness of CVD diamond films, ion beam milling was used to polish the film. The results of this experiment indicate that the ideal incident angle of ion beam varies with the surface morphology and that high accelaration voltage of ion beam is beneficial to achieving high polishing rate. It was also found that the film exposing (100) facets can be most easily polished to achieve Ra 28 nm surface roughness.
- diamond,
- film,
- polishing,
- ion beam/cvddiamond