Hu Maopu, Luan Benli. An Electrochemical Mechanism of Electroless Nickel Plating Based on AC Impedance Measurements[J]. Chinese Journal of Engineering, 1991, 13(2): 162-168. doi: 10.13374/j.issn1001-053x.1991.02.012
Citation:
Hu Maopu, Luan Benli. An Electrochemical Mechanism of Electroless Nickel Plating Based on AC Impedance Measurements[J]. Chinese Journal of Engineering, 1991, 13(2): 162-168. doi: 10.13374/j.issn1001-053x.1991.02.012
Hu Maopu, Luan Benli. An Electrochemical Mechanism of Electroless Nickel Plating Based on AC Impedance Measurements[J]. Chinese Journal of Engineering, 1991, 13(2): 162-168. doi: 10.13374/j.issn1001-053x.1991.02.012
Citation:
Hu Maopu, Luan Benli. An Electrochemical Mechanism of Electroless Nickel Plating Based on AC Impedance Measurements[J]. Chinese Journal of Engineering, 1991, 13(2): 162-168. doi: 10.13374/j.issn1001-053x.1991.02.012
The Model 368 system was used to measure the AC impedance of the process of electroless nickel plating. One inductive loop is found at low frequencies. A theoretical model including the step of adsorption of H2PO2- ions is established based on the AC impedance measurements.