Surface State of Fine Si3N4 Powders Made from Thermal Decomposition of SilicOn-Imide
-
摘要: 用XPS表面分析,研究了由氨解法在不同溫度下熱解所得的Si3N4粉末,并與由硅粉氮化所得的商用Si3N4粉末作了比較。由氨解法制備的Si3N4粉末其表面存在兩種狀態的氧:結合狀態的氧和吸附態的氧,其表面組成為Si2.2-2.7N2.9-3.7O。由硅粉氮化所制得Si3N4其表面也存在兩種狀態的氧,其表面組成則為Si0.8N0.8O。Abstract: Si3N4 powders made from imide process and thermal decomposed at different temperatures have investigated by XPS surface analysis; They were compared with a commercial Si3N4 powder made with nitridation process. Oxygen both in combined form of Si2.2-2.7N2.9-3.7O layer and absorbed form were found on the powder surface, in contrast to Si0.8 N0.8O layer and absorbed form in the case of Si3N4 powders made from Si aitridation.
-
Key words:
- XPS /
- Si3N4 /
- powder /
- thermal decomposition
-

計量
- 文章訪問數: 274
- HTML全文瀏覽量: 71
- PDF下載量: 7
- 被引次數: 0