Electrodepositied MoS2 in the Pores of Anodic Films on Aluminium
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摘要: 觀察了實驗條件對恒電流密度下二次陽極處理電解沉積MoS2對應的電壓時間關系曲線和膜顏色的影響。電子探針分析表明,沉積的固體潤滑劑在整個孔的深度范圍存在,但接近孔口的膜外表面下含量較高。透射電鏡觀察發現二次陽極處理過程實質上為二次陽極氧化過程,膜的阻擋層增厚,其厚度與電壓的比值在1.0~1.4nm/V范圍。原多孔膜底部未發生對應高電壓的大孔的起源和發展。沉積MoS2的工藝使膜的硬度有所下降。膜的摩擦系數降低,耐磨性提高。Abstract: The factors affecting the voltage-time transients of anodic electro-deposition of porous anodic films on aluminium in (NH4)2MoS4 solution at various constant current densities have been studied. EPMA analyses reveal that the deposited solid lubricant distributes in the whole pore profile and has higher content in the region near the outer surface of the film. It is suggested that the DC anodic deposition process is a reanodizing process. The thickness of barrier layer increases with the rise of the voltage during reanodizing. The ratio between the thickness of barrier layer and the applied voltage is in the range of 1.0~1.4nm/V. No initiation of larger pores and cells corresponding to the higher voltage was found in the newly developed barrier layer. The films with MoS2 deposition have lower friction coefficent and higher wear resistance, but its hardness is lowered.
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Key words:
- Aluminium /
- porous anodic film /
- reanodizing /
- MoS2 /
- lubricate /
- electrodeposition
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