Abstract: By using magnetic sputtering disposition four films were made by sputtering two iron target materials and two nickel target materials on a base material (1Cr18Ni9Ti). Corrosion resistances of these films, target materials and base material mentioned above were studied in various H₂SO₄ concentration solutions and the pitting resistance of the film were also investigated in 0.05mol/L H₂SO₄ solution. It has been found from the Tafel Plots, the cyclic polarization measurements and the microscopic internal analysis that sputtered films are microcrystal organization and have better corrosion resistances including pitting resistance than the target material without sputtering.